BENEV GF Hydrogel Moisturizing Mask calms and soothes skin with intense moisture and antioxidants. Growth factors in this formula repair skin's natural moisture barrier, so you're left with a complexion that's refreshed, radiant and youthful. This hydrating mask is made with a polymer hydrogel that soothes the skin and locks in hydration while infusing the complexion with potent growth factors. With its cooling effect, this mask is great for post-procedure skin, as well as dry, dehydrated skin. It's also perfect for those who want to reduce redness in the skin.
Use after any non-ablative treatment, such as microdermabrasion, chemical peel, LED, or IPL. Open pouch and apply mask to skin. Leave on 15-20 minutes and peel away (gel design will not adhere to skin, leaving it calm and hydrated). Do not rinse. Moisturize and protect skin after removal.
Key Ingredients: Chondrus Crispus (Red Algae) Powder, Artemisia Princeps Leaf Extract, Epidermal Growth Factor, Green Tea Extract, Dipalmitoyl Hydroxproline
Wrinkles and Fine Lines
|Mon-Thur||9 - 6 p.m. CT|
|Fri||9 - 5 p.m. CT|
|Sat||9 - 3 p.m. CT|
|Sun / Holidays||Closed|